Formation of Ge Quantum Dot and Shell for Si on Insulator Applications
碩士 === 國立中央大學 === 電機工程學系 === 102 === This thesis continuously studied the formation of Ge QDs using thermal oxidation of poly-SiGe pillar/Si3N4/Si heterostructure in our lab, and further discussed the dependence of morphology and internal defects of Ge QD between oxidation and annealing conditio...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/08688797233761845118 |