The Research of Collimated Exposure Machine

• Main Authors: Yen-An Chen, 陳彥安
• Other Authors: Rong-Seng Chang
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/66csqj

碩士 === 國立中央大學 === 光電科學與工程學系 === 102 === In this study, we present a research and development of a collimated exposure machine. The introduction of concept of development, the simulation of the optical system and the assembly of the optical components. The study of collimated exposure machine use xenon short-arc lamp as the light source, through a variety of optics ,the light will be homogenized. LightTools is used as a design program, then use the optics which are made in Taiwan to build an optics system to complete the designation. The result is a 125mmX125mm exposure area with 4% uniformity exposure machine. The simulation and the assembly of the optical system for the exposure machine use for PCB and FDP manufacture process are the major issue of this tractate.