Surface Texturization Technology on the Applications of Heterojunction Silicon Solar Cells

• Main Authors: Shao-ze Tseng, 曾少澤
• Other Authors: Sheng-hui Chen
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/r5j88b

博士 === 國立中央大學 === 光電科學與工程學系 === 102 === The photo-currents of solar cells are dependent on the optical loss. For example, there is about 36% of average reflectance on a polished Si wafer within the absorb wavelength region. Therefore, how to fabricate an anti-reflection structure to achieve a high efficiency solar cell has been one of the popular research topics. In this research, a method for a HJT solar cell fabricated by using radio frequency magnetron sputtering has been described. The HJT solar cell was formed on a nanostructure silicon substrate fabricated using the nanosphere lithography process. The nanostructure properties were analyzed to compare with the output characteristics of the HJT solar cell. According to our measurement results, the average reflectance of a Si wafer with the bullet anti-reflection nanostructure was decreased to 1.24% between the wavelength arrange of 400 nm ~ 1000 nm. Then we deposited an anti-reflection thin film on the bullet nanostructure to achieve a better anti-reflection effect where the average reflectance was decreased to 0.53%. The best conversion efficiency of the nanopattern silicon substrate (NPSiS) HJT solar cell was 31.49% greater than that of the HJT solar cell on a flat silicon wafer. The average reflectance of the NPSiS HJT solar cell and the polished HJT solar cell were 2.04% and 14.80%, respectively.