Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)

碩士 === 國立清華大學 === 材料科學工程學系 === 102 === To data, GaAs nanowires(NWs) have been mostly grown on the GaAs substrates, while, far fewer studies have been on the synthesis of GaAs NWs on Si substrates by molecular beam epitaxy (MBE). The growth of GaAs NWs on Si offers the possibility to investigate the...

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Main Authors: Gu, You-Jung, 古又中
Other Authors: Huang, Jin-Hua
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/53750320046267444210
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spelling ndltd-TW-102NTHU51590272016-03-14T04:13:23Z http://ndltd.ncl.edu.tw/handle/53750320046267444210 Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111) 以鎵自催化方式在矽基板上所成長的核殼結構砷化鎵奈米線與其電性質 Gu, You-Jung 古又中 碩士 國立清華大學 材料科學工程學系 102 To data, GaAs nanowires(NWs) have been mostly grown on the GaAs substrates, while, far fewer studies have been on the synthesis of GaAs NWs on Si substrates by molecular beam epitaxy (MBE). The growth of GaAs NWs on Si offers the possibility to investigate the optical and electrical properties of the nanowires; moreover, it is expected to combine advantages high efficient III-V materials and low-cost silicon technology. Traditionally, fabrication of GaAs NWs has mainly relied on the use of gold as catalyst via the vapor-liquid-solid (VLS) mechanism. However, the incorporation of gold may generate deep level traps and degrade the electron and hole transport properties of the nanowires. In this work, so-called self-assisted method was employed to grow the GaAs NWs on (1 1 1)Si, where Ga droplets in the pinholes of Si native oxide were used to induce anisotropic growth. We have successfully grown coaxial GaAs NWs on Si(111) substrates by MBE using Be and Si as the p-type and n-type dopants, respectively. During NW growth, we fixed the shell growth time and changed the core growth time. We found the lengths of the nanowires increase with core growth time, while the diameters of the nanowires remain almost constant. All the GaAs core-shell NWs have been subjected to the following pn junction fabrication processes: insulator spin coating, insulator reactive-ion-etching, and conductive layer depositing. I-V properties of the as-fabricated nanowire pn devices were then investigated. We discussed the effect of the nanowire length, insulator etching condition, and types of conductive layer on the I-V properties of NW devices. We observed all fabricated NW devices have exhibited the properties of diode, suggesting their potential use as building blocks in solar cells. Huang, Jin-Hua 黃金花 2014 學位論文 ; thesis 74 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學工程學系 === 102 === To data, GaAs nanowires(NWs) have been mostly grown on the GaAs substrates, while, far fewer studies have been on the synthesis of GaAs NWs on Si substrates by molecular beam epitaxy (MBE). The growth of GaAs NWs on Si offers the possibility to investigate the optical and electrical properties of the nanowires; moreover, it is expected to combine advantages high efficient III-V materials and low-cost silicon technology. Traditionally, fabrication of GaAs NWs has mainly relied on the use of gold as catalyst via the vapor-liquid-solid (VLS) mechanism. However, the incorporation of gold may generate deep level traps and degrade the electron and hole transport properties of the nanowires. In this work, so-called self-assisted method was employed to grow the GaAs NWs on (1 1 1)Si, where Ga droplets in the pinholes of Si native oxide were used to induce anisotropic growth. We have successfully grown coaxial GaAs NWs on Si(111) substrates by MBE using Be and Si as the p-type and n-type dopants, respectively. During NW growth, we fixed the shell growth time and changed the core growth time. We found the lengths of the nanowires increase with core growth time, while the diameters of the nanowires remain almost constant. All the GaAs core-shell NWs have been subjected to the following pn junction fabrication processes: insulator spin coating, insulator reactive-ion-etching, and conductive layer depositing. I-V properties of the as-fabricated nanowire pn devices were then investigated. We discussed the effect of the nanowire length, insulator etching condition, and types of conductive layer on the I-V properties of NW devices. We observed all fabricated NW devices have exhibited the properties of diode, suggesting their potential use as building blocks in solar cells.
author2 Huang, Jin-Hua
author_facet Huang, Jin-Hua
Gu, You-Jung
古又中
author Gu, You-Jung
古又中
spellingShingle Gu, You-Jung
古又中
Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
author_sort Gu, You-Jung
title Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
title_short Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
title_full Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
title_fullStr Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
title_full_unstemmed Self-Catalyzed Growth and Electrical Properties of GaAs Core-Shell Nanowires on Si (111)
title_sort self-catalyzed growth and electrical properties of gaas core-shell nanowires on si (111)
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/53750320046267444210
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