Characteristics of Nitrogen Doped Zr-Ti-Ni Thin Film Metallic Glass and Application to Ultra-Thin Diffusion Barrier

• Main Authors: Chih-Wei Wang, 王智緯
• Other Authors: Chun-Hway Hsueh
• Format: Others
• Language: en_US
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/95288812946279310073

碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 102 === Bulk metallic glasses (BMGs), which are fabricated by rapid quenching from melting metallic alloys, have developed for decades. Thanks to their amorphous structure, BMGs have excellent mechanical and many special properties. However the application of BMGs is restricted by their difficult process and poor ductility. Thin film metallic glass (TFMG) is a new research direction for metallic glass, which has almost all merits of BMGs. The major difference between BMGs and TFMGs is that it is easier to fabricate TFMGs than BMGs. In this thesis, the effect of doping nitrogen into Zr-Ti-Ni thin film metallic glass, which has great mechanical properties, was investigated systematically. Nitrogen- doping was proved to have obvious effect on Zr-Ti-Ni TFMGs’ mechanical properties and their microstructures. The hardness and scratch resistivity of Zr-Ti-Ni TFMG with 15.8% N content were much higher than nitrogen-free TFMG for three times, which was enhanced by solute clusters existed in amorphous matrix. The performance of Zr-Ti-Ni thin film metallic glass (TFMG) as a diffusion barrier between silicon and copper layers is also reported. TFMG diffusion barriers in 5 nm thicknesses with 0/15.8/20.9% nitrogen contents were proved to have great thermal stability and nitrogen atoms play the critical role for retarding barriers failure; i.e., the thermal stability of Zr based TFMG contained 20.9% N is better than other two kinds of TFMG.