| Summary: | 碩士 === 南台科技大學 === 光電工程系 === 102 === In this study, ZnO/MgO thin films were prepared by sol-gel process, and multi-layer films were composed by spin-coating method. Rapid thermal annealing (RTA) was used to make stabilize and crystallize films.
The Taguchi method was used to observe the effects of various factors on the ZnO and MgO films, such as the reaction temperature, the addition amount of main material (zinc nitrate or magnesium nitrate), the addition amount of solvent (isopropyl alcohol or ethanol), and the addition amount of catalyst (ethanolamine or cellulose nitrite), in order to get the best factor for the surface morphology of the films. The crystallize of ZnO films on various annealing temperature (600,700,800℃) were analyzed, and the crystallize of MgO films on various annealing temperature (700,800,900℃) also were analyzed.
To reach high reflectivity, we used the ZnO and MgO film to design the center wavelength (400nm) of Distributed Bragg reflector (DBR). From the FE-SEM results, we observed the reflection structural appearance. By UV-VIS measurement, the 11 pairs ZnO/ MgO multi-layer film can reach the highest reflectivity of 99.4% at the 370nm center wavelength.
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