The Development of the Top Exposure Constraint Surface Stereolithography System

• Main Authors: Jyun-Sian Liou, 劉俊賢
• Other Authors: Jia-Chang Wang
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/734579

碩士 === 國立臺北科技大學 === 製造科技研究所 === 102 === This research is focusing on VP (Vat Photopolymerization) process using DLP (Digital Light Processing). The objective of this research is to develop a new AM (Additive Manufacturing) system to be able to create middle size part with good surface quality, high building up speed, low maintenance cost. Also the software to control the system has been developed which has the ability to do image distortion correction and uniform energy distribution. The developed VP process is using anti-adhesion films to constraint meniscus. Its inhibition bulk on positive resin meniscus and greatly reduced suction on the transparent material. The optimization separate process will torn apart prototype usefully in efficient way, the building area will enlarge, and the complex geometry models will easily produce. Moreover, in order to build middle size part, the developed VP system is using upper exposure approach. In order to reduce the need of resin in the large resin tank, the support liquid using glycerin, which will left the resin on the top, to keep the reaction surface to be the resin. The resulting system shows the capability to build up parts in dimension of 432×384×200 mm. The resolution in X-Y plane is 0.2 mm, the thickness is 0.1 mm, and the building up speed is 30sec every layer.