Surface analysis of SiOx film with different siloxane monomer by cyclonic atmospheric pressure plasma

• Main Authors: Chin-Ho Lin, 林晉合
• Other Authors: Chun Huang
• Format: Others
• Language: zh-TW
• Online Access: http://ndltd.ncl.edu.tw/handle/4u7xq5

碩士 === 元智大學 === 化學工程與材料科學學系 === 102 === The target of this study is to use cyclonic atmospheric-pressure plasma to deposit SiOx films by applying Tetramethyldisiloxane (TMDSO), Hexamethyldisiloxane (HMDSO) and Tetraethyl orthosilicate (TEOS) as monomers. In this study, SiOx deposition under different plasma conditions include in plasma power, argon flow rate, monomer flow rate, and distance from nozzle to the surface of substrate. The surface properties of SiOx films were demonstrated by different analyzers. The study meanwhile compares the deposition results of TMDSO, HMDSO and TEOS in the same plasma condition. According to the results of analysis, the plasma conditions were found out to deposit SiOx films on polymers to prepare protective films. In summary, the carbon component which contain in SiOx film is decreased by adjusting the distance from the nozzle to substrate, and surface morphology of SiOx films show smoother surface with decreasing plasma power. The quality of SiOx film could be changed by modulating plasma parameters, and TMDSO is the most effective in these three monomers. The finding shows that surface hardness of polymers can be improved to 2H and maintain optical transmission after SiOx films deposited.Therefore, it is a convenient way to prepare harder protective films at the atmospheric pressure.