Surface analysis of SiOx film with different siloxane monomer by cyclonic atmospheric pressure plasma
碩士 === 元智大學 === 化學工程與材料科學學系 === 102 === The target of this study is to use cyclonic atmospheric-pressure plasma to deposit SiOx films by applying Tetramethyldisiloxane (TMDSO), Hexamethyldisiloxane (HMDSO) and Tetraethyl orthosilicate (TEOS) as monomers. In this study, SiOx deposition under differen...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/4u7xq5 |