Investigation on High Performance Indium Zinc Tin Oxide Semiconductor for Thin Film Transistors Application
博士 === 國立交通大學 === 電子工程學系 電子研究所 === 103 === In recent years, the transparent amorphous oxide semiconductor (TAOS) has attracted a lot of attention to replace the silicon material as the channel layer of thin film transistors (TFTs). Among these materials, the indium gallium zinc oxide (InGaZnO: IGZO)...
Main Authors: | Fuh, Chur-Shyang, 傅治翔 |
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Other Authors: | Sze, Simon M. |
Format: | Others |
Language: | en_US |
Published: |
2014
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Online Access: | http://ndltd.ncl.edu.tw/handle/bbj7mz |
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