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碩士 === 國立中央大學 === 能源工程研究所 === 103 === Porous silicon has high surface area and adsorption property with good compatibility with semiconductor fabrication, which can be applied to many advanced technology, such as lithium-ion batteries, biological and chemical sensors, and surface texturization in ph...

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Main Authors: Shang Yang, 楊尚
Other Authors: Ming-Tsung Hung
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/99456112631413698527
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spelling ndltd-TW-103NCU053990022016-09-25T04:04:49Z http://ndltd.ncl.edu.tw/handle/99456112631413698527 none 白金奈米粒子粒徑與分佈密度對多孔矽蝕刻影響之研究 Shang Yang 楊尚 碩士 國立中央大學 能源工程研究所 103 Porous silicon has high surface area and adsorption property with good compatibility with semiconductor fabrication, which can be applied to many advanced technology, such as lithium-ion batteries, biological and chemical sensors, and surface texturization in photovoltaic cells. It also has low thermal conductivity compared to bulk silicon, which is favorable as thermal insulation or thermoelectric materials. Numerous methods have been developed to fabricate porous silicon, such as dry etching, electrochemical etching, and metal-assisted chemical etching, The metal-assisted chemical etching is relatively simple and cost-effective, in which a thin layer of noble metal, served as a catalyst, is deposited on the smaple surface and then immersed in a mixed solution containing hydrofluoric acid and oxidant. Numerous studies have shown the fabrication of various nanostructures with different catalyst metal. However, the study on the effects of catalyst layer morphology is very rare. In this work we use platinum as catalyst, due to its faster etching rate and better stability in disolution. The Pt film is thermal annealed to form nanoparticles flowed by the metal-assisted chemical etching to investigate its effects to the etching results. First we compared the size and distribution of nanoparticles in different annealing conditions with various atmospheres, annealing time, temperature, and platinum thickness. Then we observe the etching profiles using scanning electron microscopy. In the results, we found there are negligible effects in annealing time and atmospheric gases in high annealing temperature. And the higher the Pt thickness result the higher the nanoparticles size. In etching results, the etching rates are the same for various sizes of nanoparticles. The number density of nanoparticles is a key for structure morphology. Higher number density tends to form porous structures with some etching at the top of the structures, while lower number density tends to form columnar structures without etching at the top of the structures. Ming-Tsung Hung 洪銘聰 2015 學位論文 ; thesis 115 zh-TW
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description 碩士 === 國立中央大學 === 能源工程研究所 === 103 === Porous silicon has high surface area and adsorption property with good compatibility with semiconductor fabrication, which can be applied to many advanced technology, such as lithium-ion batteries, biological and chemical sensors, and surface texturization in photovoltaic cells. It also has low thermal conductivity compared to bulk silicon, which is favorable as thermal insulation or thermoelectric materials. Numerous methods have been developed to fabricate porous silicon, such as dry etching, electrochemical etching, and metal-assisted chemical etching, The metal-assisted chemical etching is relatively simple and cost-effective, in which a thin layer of noble metal, served as a catalyst, is deposited on the smaple surface and then immersed in a mixed solution containing hydrofluoric acid and oxidant. Numerous studies have shown the fabrication of various nanostructures with different catalyst metal. However, the study on the effects of catalyst layer morphology is very rare. In this work we use platinum as catalyst, due to its faster etching rate and better stability in disolution. The Pt film is thermal annealed to form nanoparticles flowed by the metal-assisted chemical etching to investigate its effects to the etching results. First we compared the size and distribution of nanoparticles in different annealing conditions with various atmospheres, annealing time, temperature, and platinum thickness. Then we observe the etching profiles using scanning electron microscopy. In the results, we found there are negligible effects in annealing time and atmospheric gases in high annealing temperature. And the higher the Pt thickness result the higher the nanoparticles size. In etching results, the etching rates are the same for various sizes of nanoparticles. The number density of nanoparticles is a key for structure morphology. Higher number density tends to form porous structures with some etching at the top of the structures, while lower number density tends to form columnar structures without etching at the top of the structures.
author2 Ming-Tsung Hung
author_facet Ming-Tsung Hung
Shang Yang
楊尚
author Shang Yang
楊尚
spellingShingle Shang Yang
楊尚
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author_sort Shang Yang
title none
title_short none
title_full none
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title_full_unstemmed none
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publishDate 2015
url http://ndltd.ncl.edu.tw/handle/99456112631413698527
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