| Summary: | 碩士 === 國立中山大學 === 材料與光電科學學系研究所 === 103 === Control of thin film morphologies through self-assembly of high-Mw polystyrene-b-poly (methyl methacrylate) (PS-PMMA) block copolymers (BCPs) are carried out to generate one-dimensional (1-D) or three-dimensional (3-D) polymer-based photonic crystals (PCs). By exposing the as-spun BCP film into a PMMA selective solvent for annealing, short-range ordered network morphologies can be obtained, resulting in the angle-independent reflected bands of amorphous photonic crystals (APCs) in responsive to external solvents in visible wavelength, namely solvatochromism. Performing BCP/homopolymer blends makes red shifting of the stop-band gaps due to the increased microdomain thickness. Most interestingly, the fabrication of the angle-dependent PCs or angle-independent APCs can be successfully carried out using PS-PMMA/PS/PMMA ternary blends. Taking advantage of the degradable characteristic of the PMMA segment allows us to first generate porous polymeric templates after exposure to UV irradiation and thereby inorganic SiO2 or TiO2 network microstructures via subsequent sol-gel processes and calcination, materializing the thin film photonic reflectors with high reflectivity and tunable refractive index contrast. Finally, with the integration of the top-down (i.e., photolithography) and bottom-up (i.e., rapid self-assembly) methods, the photopatterned APC thin films with organic, inorganic and hybrid materials are materialized for the first time. As a result, this provides a novel concept to materialize the organic, inorganic and hybrid APC or PC reflectors with the capability of pattern design in visible wavelengths for practical applications.
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