| Summary: | 碩士 === 國立虎尾科技大學 === 電子工程系碩士班 === 103 === In this study, vanadium and vanadium oxide material having a resistance change with temperature characteristics, by RF magnetron sputtering to prepare a film with a DC magnetron sputtering, deposition temperature and the change control process time to observe changes in the resistance value and Temperature coefficient of resistance (TCR), the use of 3D printer produced a measurement system attendance, improved heating and correction measurement base to maintain a balance, using the four-point measurement analysis film resistance and TCR as the temperature changes, and the use of double beam spectrophotometer measurement analysis of transmittance and absorption of vanadium oxide.
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