Preparation of Electrochromic Nickel Oxide Films by Electrochemical Deposition

• Main Authors: Chi Ya Chun, 紀雅鈞
• Other Authors: 詹志潔
• Format: Others
• Language: zh-TW
• Published: 2016
• Online Access: http://ndltd.ncl.edu.tw/handle/53098161188978848861

碩士 === 逢甲大學 === 化學工程學系 === 104 === The rapid development of electrochromic materials has much attention to the academic research and technological application in recent years. Not only applied to smart windows that balances lightening and air conditioning needs, the electrochromic devices can apply to much optical articles and the vehicle and the digital display also. The adventage of electrochromic device is fine transmittance control, memory effect and quick response. In this study, a thin film electrochromic nickel oxide layer and nickel thin film, which are respectively deposited on anode and cathode that substrate are ITO, was coated transparent glass by electrochemical deposition. This method results in not only low energy consumption and low cost for production, but also easy application. As the results, the light modulation of nickel oxide films becomes smaller with increasing calcination temperature, however as the standing time increase the light modulation of nickel oxide films become larger. Than we find that nickel oxide films have the best light modulation 77.82% with condition of the calcination at 100℃.Nickel film can be oxidation formed nickel oxides film when the calcination temperature is about 400℃. And the film has 600℃ calcination with maximum light modulation and shortest response time. All the bleaching state of penetrate rate could reach 80%.