Improvising the Rinse Efficiency in a Wafer Rinse Process Using 3D Numerical Modeling and Flow Visualization Methods
碩士 === 國立成功大學 === 機械工程學系 === 104 === Semiconductor wafers, which is the base of any semiconductor devices subjects to numerous bathing in a wafer rinsing tank post each processing operation, in order to remove surface contamination that arises during the manufacturing protocols. However in this meth...
Main Authors: | Yen-HengLiu, 劉彥亨 |
---|---|
Other Authors: | Chia-Yuan Chen |
Format: | Others |
Language: | zh-TW |
Published: |
2016
|
Online Access: | http://ndltd.ncl.edu.tw/handle/25786882112349552898 |
Similar Items
-
The Investigation in Optimal Wafer Rinsing Process
by: Hui-Hsiu Tang, et al.
Published: (1999) -
Rinsing Of Wafers After Wet Processing: Simulation And Experiments
by: Chiang, Chieh-Chun
Published: (2015) -
Efficacy of two commonly available mouth rinses used as preprocedural rinses in children
by: Eapen Thomas
Published: (2011-01-01) -
Rinsing in the combination therapy of tonsillopharyngitis
by: E V Nosulia
Published: (2014-10-01) -
Scourge and rinse with pail and bucket
by: Andersson, Elias
Published: (2016)