Fabricate nano worm-like tunnel of silicon by copper particals assisted etching

• Main Authors: Cheng-Long Ho, 何承隆
• Other Authors: Tien-Hsi Lee
• Format: Others
• Language: zh-TW
• Published: 2016
• Online Access: http://ndltd.ncl.edu.tw/handle/58379579005410253975

碩士 === 國立中央大學 === 機械工程學系 === 104 === One-dimensional (1D) nanomaterials have attracted much attention due to the unique structure, which have found many potential applications in electronic, optical and magnetic devices. Porous anodic aluminum oxide (AAO) templates, are most frequently used to fabricate 1D materials and devices. However, the AAO templates are too fragile to be assembled into sturdy device. With porous silicon templates replacing the AAO templates, the dilemma of AAO template can be avoided. This paper describes fabricating nano tunnel of silicon by copper assisted etching. Compare with electrochemical etching, the results of etching appearance were different. We investigated the formation mechanism of the nano wormhole-like tunnel of silicon, and analyzed the process of nano-tunnel of silicon formation. In different condition, we find the regularity between deposition and etching. By the porous structures etched in various conditions, the porous silicon templates have been prepared.