The Study of Highly Adhesive Electroless Nickel Plating Film on Silicon Wafer

碩士 === 國立清華大學 === 化學工程學系 === 104 === Electroless deposition of nickel-phosphorus (Ni-P) film is a promising skill for the preparation of diffusing barrier layer in silicon and circuit board industry. Typically, Sn/Pd colloid is the most common catalyst for electroless deposition. However, lacking of...

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Bibliographic Details
Main Authors: Hsu, Chin Wei, 許晉偉
Other Authors: Wei, Tzu-Chien
Format: Others
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/pv8mj3