| Summary: | 碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 104 === In this study, we fabricated and characterized the substrates of dropped silver nanoparticles and silver nanospheres in silver nanoholes substrates by using thermal evaporation combined with nanosphere lithography (NSL) and reactive ion etching (RIE).
At first, we used SEM to observe the surface of the substrates, and examined the characteristics of substrates by Raman measurements. To investigating the influences of photoluminescence and time-resolved photoluminescence of the fluorescent dye, we deposited SiO2 20nm in thickness on the substrates as buffer layer and then deposited fluorescent dye "DCJTB" 75nm in thickness on the silver nanoholes substrate. We observed that the PL intensity of DCJTB deposited on the dropped silver nanoparticles in 400nm silver nanoholes substrate was increased about 7.528 times, and that of DCJTB deposited on the dropped silver nanoparticles in 800nm silver nanoholes substrate was increased about 10.625 times, respectively, as compared with those DCJTB deposted on bare silicon. On the other hand, we observed that the PL intensity of DCJTB deposited on the dropped silver nanospheres in 400nm silver nanoholes substrate was increased about 15.692 times, and that of DCJTB deposited on the dropped silver nanospheres in 800nm silver nanoholes substrate was increased about 12.167 times, respectively, as compared with those DCJTB deposted on bare silicon.
We proved that the number of nanoparticles and thichness of sliver film in silver nanoholes substrates could affect the excited localized surface plasmon and enhance the resonance vibration strength of fluorescent molecules. Therefore, the PL intensity is increased and the lifetime is shortened at the same time.
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