| Summary: | 碩士 === 國立臺灣科技大學 === 電子工程系 === 104 === Hot embossing nanoimprint lithography (NIL) manufacturing only required a previously made mold by using electron beam lithography, and use the mold to imprint repeatedly and quickly to produce nano-level structure. Therefore, it can reduce waste of time and the cost compare to the fabricated grating structure of traditional lithography.
In this study, we used hot embossing nanoimprint lithography to fabricate a grating for gallium nitride based distributed feedback lasers. The pitch of the grating is 254 nm. To improve the hot embossing nanoimprint lithography process in the previously study of our laboratory, we remake a new mold and design the support structure which is used to make the pressure average on grating in the imprint process and formed a passage that the air can be discharged outside the substrate. After we continuously design and test parameter in this experiment. This study not only imprint the grating of 20μm width we design but also imprint the grating of 5 μm width. The duty cycle is about 50%, it shows that our experiment results are outstanding by hot-embossing nanolithography. Finally, we used dry etching to transfer our grating structure imprinted on the top of gallium nitride surface to the gallium nitride substrate to make grating for distributed feedback lasers.
This experiment successfully fabricated the grating structure of gallium nitride. Unfortunately, we did not make the distributed feedback lasers, the main reason might be we could not align the transferred pattern to substrate. If we can overcome this problem, it has highly opportunity for us to fabricate the gallium nitride based distributed feedback lasers using hot embossing nanoimprint lithography.
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