Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method

碩士 === 元智大學 === 光電工程學系 === 104 === Diffraction grating is widely used in grating interferometry for sensing displacement. The grating performance affects the accuracy of the measurement. Therefore, optimum fabrication conditions of the diffraction grating should be adopted for approaching better dif...

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Bibliographic Details
Main Authors:	Jui-Yang Wu, 吳睿洋
Other Authors:	Cheng-Chih Hsu
Format:	Others
Language:	zh-TW
Published:	2016
Online Access:	http://ndltd.ncl.edu.tw/handle/25w55a

id	ndltd-TW-104YZU05614015
record_format	oai_dc
spelling	ndltd-TW-104YZU056140152019-05-15T22:53:48Z http://ndltd.ncl.edu.tw/handle/25w55a Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method 利用單一架構拍攝多位置全像光柵之最佳化條件 Jui-Yang Wu 吳睿洋碩士元智大學光電工程學系 104 Diffraction grating is widely used in grating interferometry for sensing displacement. The grating performance affects the accuracy of the measurement. Therefore, optimum fabrication conditions of the diffraction grating should be adopted for approaching better diffraction efficiency. In this study, we applied Taguchi method to obtain optimum conditions for fabricating holographic diffraction grating. The optimum diffraction efficiency can be improved 30 % and approach to theoretical diffraction efficiency. Cheng-Chih Hsu 許正治 2016 學位論文 ; thesis 53 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 元智大學 === 光電工程學系 === 104 === Diffraction grating is widely used in grating interferometry for sensing displacement. The grating performance affects the accuracy of the measurement. Therefore, optimum fabrication conditions of the diffraction grating should be adopted for approaching better diffraction efficiency. In this study, we applied Taguchi method to obtain optimum conditions for fabricating holographic diffraction grating. The optimum diffraction efficiency can be improved 30 % and approach to theoretical diffraction efficiency.
author2	Cheng-Chih Hsu
author_facet	Cheng-Chih Hsu Jui-Yang Wu 吳睿洋
author	Jui-Yang Wu 吳睿洋
spellingShingle	Jui-Yang Wu 吳睿洋 Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
author_sort	Jui-Yang Wu
title	Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
title_short	Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
title_full	Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
title_fullStr	Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
title_full_unstemmed	Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method
title_sort	optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with taguchi method
publishDate	2016
url	http://ndltd.ncl.edu.tw/handle/25w55a
work_keys_str_mv	AT juiyangwu optimumfabricationconditionsofthemultipleexposureholographicgratingfordisplacementsensingwithtaguchimethod AT wúruìyáng optimumfabricationconditionsofthemultipleexposureholographicgratingfordisplacementsensingwithtaguchimethod AT juiyangwu lìyòngdānyījiàgòupāishèduōwèizhìquánxiàngguāngshānzhīzuìjiāhuàtiáojiàn AT wúruìyáng lìyòngdānyījiàgòupāishèduōwèizhìquánxiàngguāngshānzhīzuìjiāhuàtiáojiàn
_version_	1719137137416208384

Optimum fabrication conditions of the multiple exposure holographic grating for displacementsensing with Taguchi method

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