Vacuum-annealed Ni / Al Metal Film For Low-emissivity Glass

• Main Authors: CHEN,CHUN-YI, 陳春溢
• Other Authors: CHANG,SHANG-CHOU
• Format: Others
• Language: zh-TW
• Published: 2017
• Online Access: http://ndltd.ncl.edu.tw/handle/71643816930993108275

碩士 === 崑山科技大學 === 電機工程研究所 === 105 === Nickel and aluminum films with 5 nm in each layer were evaporated on glass Ni(5 nm)/Al(5 nm)/glass. The Ni (5 nm)/Al(5 nm)/glass samples were post annealed in hydrogen plasma. Low emissivity related properties of vacuum annealed Ni (5 nm)/Al(5 nm)/glass: microstructure, electrical and optical properties were measured. The optimum condition of materials and process condition for obtaining the low emissivity were analyzed and observed. The sheet resistance, average transmission in visible range and reflection in near infrared region of vacuum annealed Ni (5 nm)/Al(5 nm)/glass are 166.96Ω/sq , 58.64% and 16.64% This result could be applied in low emissivity coating.