Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film

Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film

碩士 === 國立成功大學 === 微電子工程研究所 === 105

Bibliographic Details
Main Authors: Chun-ChiWang, 王峻淇
Other Authors: Ching-Ting Lee
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/szwm7f
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spelling ndltd-TW-105NCKU54280572019-05-15T23:47:01Z http://ndltd.ncl.edu.tw/handle/szwm7f Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film 雷射干涉微影術結合光電化學法與鈮酸鋰鐵電薄膜製作氮化鋁鎵/氮化鎵多重通道增強式金氧半高電子遷移率場效電晶體之研究 Chun-ChiWang 王峻淇 碩士 國立成功大學 微電子工程研究所 105 Ching-Ting Lee 李清庭 2017 學位論文 ; thesis 71 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 微電子工程研究所 === 105
author2 Ching-Ting Lee
author_facet Ching-Ting Lee
Chun-ChiWang
王峻淇
author Chun-ChiWang
王峻淇
spellingShingle Chun-ChiWang
王峻淇
Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
author_sort Chun-ChiWang
title Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
title_short Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
title_full Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
title_fullStr Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
title_full_unstemmed Investigation of AlGaN/GaN Multiple Channel E-Mode MOSHEMT Fabricated Using Laser Interference Photolithography Method, Photoelectrochemical Method and LiNbO3 Ferroelectric Film
title_sort investigation of algan/gan multiple channel e-mode moshemt fabricated using laser interference photolithography method, photoelectrochemical method and linbo3 ferroelectric film
publishDate 2017
url http://ndltd.ncl.edu.tw/handle/szwm7f
work_keys_str_mv AT chunchiwang investigationofalganganmultiplechannelemodemoshemtfabricatedusinglaserinterferencephotolithographymethodphotoelectrochemicalmethodandlinbo3ferroelectricfilm
AT wángjùnqí investigationofalganganmultiplechannelemodemoshemtfabricatedusinglaserinterferencephotolithographymethodphotoelectrochemicalmethodandlinbo3ferroelectricfilm
AT chunchiwang léishègànshèwēiyǐngshùjiéhéguāngdiànhuàxuéfǎyǔnǐsuānlǐtiědiànbáomózhìzuòdànhuàlǚjiādànhuàjiāduōzhòngtōngdàozēngqiángshìjīnyǎngbàngāodiànziqiānyílǜchǎngxiàodiànjīngtǐzhīyánjiū
AT wángjùnqí léishègànshèwēiyǐngshùjiéhéguāngdiànhuàxuéfǎyǔnǐsuānlǐtiědiànbáomózhìzuòdànhuàlǚjiādànhuàjiāduōzhòngtōngdàozēngqiángshìjīnyǎngbàngāodiànziqiānyílǜchǎngxiàodiànjīngtǐzhīyánjiū
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