Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment
碩士 === 國立清華大學 === 工程與系統科學系 === 105 === 因申請專利緣故,資料延後公開
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ndltd-TW-105NTHU55930142019-05-15T23:53:45Z http://ndltd.ncl.edu.tw/handle/uz87v6 Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment 以氨氣電漿處理提升氧化鋯鉿鐵電元件之可靠度 Chen, Pin Hsuan 陳品璇 碩士 國立清華大學 工程與系統科學系 105 因申請專利緣故,資料延後公開 Wu, Yung Hsien 巫勇賢 2017 學位論文 ; thesis 76 en_US |
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en_US |
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Others
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description |
碩士 === 國立清華大學 === 工程與系統科學系 === 105 === 因申請專利緣故,資料延後公開
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author2 |
Wu, Yung Hsien |
author_facet |
Wu, Yung Hsien Chen, Pin Hsuan 陳品璇 |
author |
Chen, Pin Hsuan 陳品璇 |
spellingShingle |
Chen, Pin Hsuan 陳品璇 Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
author_sort |
Chen, Pin Hsuan |
title |
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
title_short |
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
title_full |
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
title_fullStr |
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
title_full_unstemmed |
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment |
title_sort |
enhanced device reliability for hfzrox-based ferroelectric mfm capacitor by nh3 plasma treatment |
publishDate |
2017 |
url |
http://ndltd.ncl.edu.tw/handle/uz87v6 |
work_keys_str_mv |
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1719157291182194688 |