Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity

碩士 === 國立臺灣科技大學 === 電子工程系 === 105 === Mach-Zehnder interferometry (MZI) can be applied onto communication and biomedical science. In communication, the MZI based wavelength division multiplexing (WDM) wavelength filter is sensitive to the processing variation and can be improved by the Z-transform....

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Main Authors: Hsiang - Chu, 朱翔
Other Authors: Shih-Hsiang Hsu
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/85134209783554928712
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spelling ndltd-TW-105NTUS54280062017-11-12T04:38:58Z http://ndltd.ncl.edu.tw/handle/85134209783554928712 Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity 探討與製程不敏感之多極Mach-Zehnder干涉器 Hsiang - Chu 朱翔 碩士 國立臺灣科技大學 電子工程系 105 Mach-Zehnder interferometry (MZI) can be applied onto communication and biomedical science. In communication, the MZI based wavelength division multiplexing (WDM) wavelength filter is sensitive to the processing variation and can be improved by the Z-transform. Among the three stages of the WDM filter, the delay length on the second stage, put on the opposite side compared with the previous stage besides the phase adding, demonstrates the stable and outstanding optical performance. In biomedical science, MZI was utilized to illustrate the surface plasmon resonance biosensing through the surrounding metal on silicon-wire waveguide. When the TM wave is injected into the plasmon region, there are two surface plasmon waves on the two metal layer surfaces will be generated and interfered as the interferograms. This mechanism is equivalent to a Mach-Zehnder interferometer. The surface plasmon biosensor processing can be separated as three parts, lithography, etching, and deposition of chemical vapor and physical vapor, which photomask are carried by the waveguide layer, metal window and transition region between silicon-wire and plasmon. The first photomask is process related lithorgraphy and the precise waveguide size and etch depth are crucial to the optical performance. The second photomask is the sensing related open window and the deposition will be utilized for the growth of silicon dioxide and metal. The metal thickness control is very critical to the biosensing performance. Finally the third photomask will only be used to open the transition region between the silicon-wire and plasmon. Shih-Hsiang Hsu 徐世祥 2016 學位論文 ; thesis 84 zh-TW
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language zh-TW
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sources NDLTD
description 碩士 === 國立臺灣科技大學 === 電子工程系 === 105 === Mach-Zehnder interferometry (MZI) can be applied onto communication and biomedical science. In communication, the MZI based wavelength division multiplexing (WDM) wavelength filter is sensitive to the processing variation and can be improved by the Z-transform. Among the three stages of the WDM filter, the delay length on the second stage, put on the opposite side compared with the previous stage besides the phase adding, demonstrates the stable and outstanding optical performance. In biomedical science, MZI was utilized to illustrate the surface plasmon resonance biosensing through the surrounding metal on silicon-wire waveguide. When the TM wave is injected into the plasmon region, there are two surface plasmon waves on the two metal layer surfaces will be generated and interfered as the interferograms. This mechanism is equivalent to a Mach-Zehnder interferometer. The surface plasmon biosensor processing can be separated as three parts, lithography, etching, and deposition of chemical vapor and physical vapor, which photomask are carried by the waveguide layer, metal window and transition region between silicon-wire and plasmon. The first photomask is process related lithorgraphy and the precise waveguide size and etch depth are crucial to the optical performance. The second photomask is the sensing related open window and the deposition will be utilized for the growth of silicon dioxide and metal. The metal thickness control is very critical to the biosensing performance. Finally the third photomask will only be used to open the transition region between the silicon-wire and plasmon.
author2 Shih-Hsiang Hsu
author_facet Shih-Hsiang Hsu
Hsiang - Chu
朱翔
author Hsiang - Chu
朱翔
spellingShingle Hsiang - Chu
朱翔
Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
author_sort Hsiang - Chu
title Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
title_short Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
title_full Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
title_fullStr Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
title_full_unstemmed Multi-stage Mach-Zehnder Interferometry Study on Process Insensitivity
title_sort multi-stage mach-zehnder interferometry study on process insensitivity
publishDate 2016
url http://ndltd.ncl.edu.tw/handle/85134209783554928712
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