Study of the Characteristics for Ni0.5(Ti0.3Zr0.7)0.5NbO4 Dielectric Thin Films and its Thin Films Antenna

碩士 === 國立聯合大學 === 電機工程學系碩士班 === 105 === Ni0.5(Ti0.3Zr0.7)0.5NbO4 thin films were deposited on Si(100) substrate by RF magnetron sputtering have been studied. Effects of physical and electrical properties of Ni0.5(Ti0.3Zr0.7)0.5NbO4 thin films with fixed a working pressures of 3mTorr at various R...

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Bibliographic Details
Main Authors: CHANG,CHIH-KAI, 張智凱
Other Authors: HSU,CHENG-HSING
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/49214910209170039527