| Summary: | 碩士 === 逢甲大學 === 工業工程與系統管理學系 === 106 === In recent years, the technology of science is rapidly progressing. Electronic products are getting lighter, energy and touch panel requirements, the circuit on circuit board design is more and more well. In order to prevent dust and foreign matter caused line failure and costs growth increase. Clean room cleanliness management is more and more important. The study motivation is quality improvement of photoresist factory clean room management on Dry film, the case company. The purpose of this study is effectively control the cleanliness of clean room in international standards. Through case studies, to provide the acomplete clean room management system. The study provides the referencings of clean room management for the relevant industry. In this study applies QIT operation process method. Bases on people, machine, material, law, environment for causes relationship analyzes. Implements FTIR and microscope for verfiing outcomes. Finally, the clean room is fitted to the international clean room specification. The research findings indicate that dry film, edge particle size bigger than 300um, by 3.4 points per roll down to 0.6. The particle size less or equal 300um, from the average 11.4 per roll down to 3.0. Dry film surface particle, size bigger than 100um, from 7.9 particles per roll down to 3.2. The particle size less or equal than 100um, from the average 16.6 per volume down to 5.3. The fiber, more than 1.2 per volume, is down to zero. The well research outcomes of this study, provides establishment or improvement management system of clean room referencings, to achieve reliable quality of products.
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