Effects of radio-frequency powers and annealing temperatures on characteristics of nickel-carbon thin films prepared by reactive sputtering
博士 === 國立中興大學 === 材料科學與工程學系所 === 106 === Effects of radio-frequency (rf) powers and annealing temperatures on characteristics of nickel-carbon (C-Ni films) thin films prepared by reactive sputtering are investigated. The reactive sputtering is a combination of rf-plasma enhanced chemical vapor depos...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/8296g2 |