Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices
博士 === 國立成功大學 === 微電子工程研究所 === 106
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ndltd-TW-106NCKU54280072019-07-04T05:59:27Z http://ndltd.ncl.edu.tw/handle/mzcu8z Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices 利用脈衝電沉積製備不同幾何圖案之硒化銅銦主動層元件與應用 Yu-SongCheng 鄭育松 博士 國立成功大學 微電子工程研究所 106 Mau-Phon Houng 洪茂峰 2018 學位論文 ; thesis 85 en_US |
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博士 === 國立成功大學 === 微電子工程研究所 === 106 |
author2 |
Mau-Phon Houng |
author_facet |
Mau-Phon Houng Yu-SongCheng 鄭育松 |
author |
Yu-SongCheng 鄭育松 |
spellingShingle |
Yu-SongCheng 鄭育松 Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
author_sort |
Yu-SongCheng |
title |
Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
title_short |
Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
title_full |
Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
title_fullStr |
Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
title_full_unstemmed |
Fabrication and application with pulse electrodeposited technology for various geometric CuInSe2 active layer devices |
title_sort |
fabrication and application with pulse electrodeposited technology for various geometric cuinse2 active layer devices |
publishDate |
2018 |
url |
http://ndltd.ncl.edu.tw/handle/mzcu8z |
work_keys_str_mv |
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