UV light point array oblique scanning for 2D and 3D maskless lithography
碩士 === 國立成功大學 === 機械工程學系 === 106 === This study develops a UV spot array oblique scanning system to perform maskless lithography patterning. A UV light source of 405 nm I wavelength is used along with a digital micromirror device (DMD) to modulate the UV light and to form array of UV spots. The UV l...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/47kdqm |