The study of ZnO and TiO2 thin film distributed Bragg reflection structure by RF magnetron sputter system

• Main Authors: KAO,LI-HAN, 高立翰
• Other Authors: HON,KUAN
• Format: Others
• Language: zh-TW
• Published: 2018
• Online Access: http://ndltd.ncl.edu.tw/handle/q5ab9n

碩士 === 南臺科技大學 === 光電工程系 === 106 === In this paper, ZnO, TiO2 films were grown by RF magnetron sputtering. The results show that the luminescent properties of the films are observed by scanning electron microscope, transmission electron microscope and photoluminescence. First, a layer of ZnO thin film was sputtered on a sapphire substrate using a radio frequency magnetron sputtering system with a film thickness of 100 nm, 200 nm and 300 nm, followed by a RF magnetron sputtering system on another sapphire substrate Sputtering on a layer of titanium dioxide, the film thickness of 30 nm, 60 nm and 90 nm, and then at the same time the gallium oxide film and titanium dioxide film using a high temperature furnace to carry out thermal annealing process 300 ℃ ~ 700 ℃. Followed by the use of RF magnetron sputter to prepare titanium dioxide and ZnO stacks with distributed Bragg reflector, and then using RF magnetron sputter coated with a layer of TiO2, then using RF magnetron sputter plating a layer of Ta2O5 stack to prepare the distributed Bragg reflector, and The design Bragg reflection wavelength is 720w nm. and the reflectance of the Bragg structure was measured using a light absorption spectrometer.