Development of micro wireless multi-function real-time environmental monitoring system.

• Main Authors: LIAN, WEI-BIN, 連惟彬
• Other Authors: HUANG, PO-CHENG
• Format: Others
• Language: zh-TW
• Published: 2019
• Online Access: http://ndltd.ncl.edu.tw/handle/7wc2ww

碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系 === 107 === In the past five years, Taiwan's semiconductor industry has grown at a global market share. The ratio of wafer foundry exports is the main export item. The semiconductor industry is the most competitive and most competitive industry in Taiwan in the international market, but with IC As process complexity increases and wire diameters continue to shrink, how to improve wafer yield has become the most important goal. In recent years, more and more research on wafer transfer boxes, the traditional Ballroom type clean room can not meet the cleanliness and reliability required by the current process, using the machine isolation technology, namely the micro-environment It has become a trend in the future. The micro-environment can provide high cleanliness inside the process machine, separate the personnel space from the product space, and isolate the entry of external pollutants to reduce the possibility of cross-contamination. In today's 12-inch fabs, they are loaded and transported by a 300mm wafer transfer box (Front Opening Unified Pod, FOUP) to load a certain number of wafers and filled with nitrogen or CDA (Clean Dry Air). Ensure that the wafer is not infiltrated by external gaseous pollutants during transportation. When the threshold of the wafer transfer box is opened, it is vulnerable to micro-environmental pressure difference, flow field and machine equipment, etc., resulting in gaseous pollutants and moisture in the air. And oxygen is drawn inside the wafer transfer box. Taking the etching process as an example, during the etching process, the airborne contaminant (AMC) will volatilize and adhere to the wall of the wafer transfer box. When the wafer enters the next process, the gaseous pollutants attached to the wall surface It is easy to re-evaporate and react with moisture and oxygen in the air, which causes copper loss in the wafer, which seriously affects the yield of the wafer process. Therefore, when the wafer transfer box is opened, the control is quite important, but the crystal is very important. The circular transfer box is still filled with clean dry air (CDA) or nitrogen after the threshold is opened. At present, the process below 14 nm is quite urgent for the pollutants in the air. In order to overcome the problem of the order, three different differences are proposed. In the filling system, when the door is opened, there is a blowing device in front of the door to infiltrate the airflow in the micro-environment, and there are different types of forced-cleaning devices in the interior to blow the internal attached pollutants and water vapor out of the wafer cassette. To ensure that the relative humidity inside the wafer cassette falls within an acceptable range. At present, there is a lack of means for real-time monitoring inside the wafer cassette, mostly by means of air sampling, relying on the forced netting and sampling system of each station's processing machine to force the wafer cassette and monitor the internal temperature and humidity. Variety. Therefore, this study intends to develop an affordable environmental temperature and humidity monitoring component, combined with wireless transmission of feedback data to the central database of the plant to provide users for analysis and monitoring. The air curtain structure developed by the previous research institute of this laboratory can effectively control the relative humidity and oxygen concentration inside the FOUP under the FOUP opening state, but it cannot adjust the operating parameters according to the actual machine environment. The purpose of this research is combined with the development of this laboratory. The experimental measurement method, combined with the electronic control expertise of the partner, develops an instant micro-cartridge internal environmental monitoring system, and transmits the measurement signal to the FOUP/LPU Purge system through the Bluetooth to utilize the MFC to CDA/N2 flow. Adjustments can be made to reduce the amount of CDA/N2 while effectively blocking moisture from entering the FOUP.