| Summary: | 碩士 === 國立成功大學 === 機械工程學系 === 107 === The published work of calculating the aberration coefficients showing lots of iterative operations are quit complicated. Therefore, this study based on the well-known Taylor series expansions of a skew ray with respect to the object height and the Cartesian coordinates of entrance pupil provides another simpler methodology to investigate Seidel-aberrations and Buchdahl-aberrations from the viewpoint of wavefronts and rays respectively, namely the fourth-order wavefront aberrations and the fifth-order ray aberrations.
Regarding the object height and the Cartesian coordinates of entrance pupil as the independent variables, we expand the OPL function by Taylor series expansion with respect to independent variables. Then, the polynomial of the fourth-order wavefront aberration can be obtained by the relation between OPD and the wavefront aberration. Similarly, the polynomial of the fifth order ray aberration can be attained by using Taylor series expansion of incident point on image plane with respect to independent variables. As we simplify both polynomials determined by utilizing the symmetric properties of the axis-symmetrical optical systems, an alternative aberration function would be derived.
Finally, substituting the value of aberration coefficients calculated by the numerical software of our laboratory into the aberration functions, we can solve the magnitude of variety aberrations as well as compare the results with which from optical software to verify the correctness of this theory. It is found that the obtained values of this thesis agree remarkably with those attained by Zemax simulation.
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