Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography

碩士 === 國立交通大學 === 光電工程研究所 === 107

Bibliographic Details
Main Authors:	Hsu, Zheng-Ning, 徐證甯
Other Authors:	Chen, Huang-Ming Philip
Format:	Others
Language:	zh-TW
Published:	2018
Online Access:	http://ndltd.ncl.edu.tw/handle/7mgsu3

id	ndltd-TW-107NCTU5124042
record_format	oai_dc
spelling	ndltd-TW-107NCTU51240422019-05-16T01:40:47Z http://ndltd.ncl.edu.tw/handle/7mgsu3 Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography 深藍光純相位矽基液晶空間光調制器以多重曝光方法於無光罩全像微影應用 Hsu, Zheng-Ning 徐證甯碩士國立交通大學光電工程研究所 107 Chen, Huang-Ming Philip Chen, Cheng-Huan 陳皇銘陳政寰 2018 學位論文 ; thesis 55 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立交通大學 === 光電工程研究所 === 107
author2	Chen, Huang-Ming Philip
author_facet	Chen, Huang-Ming Philip Hsu, Zheng-Ning 徐證甯
author	Hsu, Zheng-Ning 徐證甯
spellingShingle	Hsu, Zheng-Ning 徐證甯 Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
author_sort	Hsu, Zheng-Ning
title	Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
title_short	Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
title_full	Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
title_fullStr	Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
title_full_unstemmed	Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
title_sort	deep-blue light phase-only lcos with multiple exposure method for mask-less lithography
publishDate	2018
url	http://ndltd.ncl.edu.tw/handle/7mgsu3
work_keys_str_mv	AT hsuzhengning deepbluelightphaseonlylcoswithmultipleexposuremethodformasklesslithography AT xúzhèngníng deepbluelightphaseonlylcoswithmultipleexposuremethodformasklesslithography AT hsuzhengning shēnlánguāngchúnxiāngwèixìjīyèjīngkōngjiānguāngdiàozhìqìyǐduōzhòngpùguāngfāngfǎyúwúguāngzhàoquánxiàngwēiyǐngyīngyòng AT xúzhèngníng shēnlánguāngchúnxiāngwèixìjīyèjīngkōngjiānguāngdiàozhìqìyǐduōzhòngpùguāngfāngfǎyúwúguāngzhàoquánxiàngwēiyǐngyīngyòng
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Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography

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