Analysis of Design and Fabrication on Silicon Wire Optical Filter

• Main Authors: Zheng-Shun Liu, 劉正舜
• Other Authors: Shih-Hsiang Hsu
• Format: Others
• Language: zh-TW
• Published: 2019
• Online Access: http://ndltd.ncl.edu.tw/handle/ysask4

碩士 === 國立臺灣科技大學 === 電子工程系 === 107 === Arrayed Waveguide Grating (AWG) and Echelle Grating (EG) are commonly utilized for multiplexing and demultiplexing in wavelength division multiplexing (WDM) communications. Both filter devices are using optical array interference, but the implementation of light path delay is different. Firstly, the principle and simulation for AWG and EG will be introduced in this thesis. And then the AWG application in spectral domain optical coherence tomography (SD-OCT) is going to be further discussed. Next, the process design to improve the filter device performance will be demonstrated. Additionally, the AWG with a multimode interference (MMI) at the entrance port of the waveguide array could be illustrated to obtain the flattened spectral response, followed by the dense and coarse WDM demultiplexers. All simulations were executed by Photon Design’s commercial software through EPIPPROP and FIMMPROP. The silicon wire based photonic devices mentioned in the thesis are not only sent to the Interuniversity Microelectronics Centre (IMEC) for process, but also fabricated in Taiwan Semiconductor Research Institute (TSRI). In TSRI. the process between the I-line stepper and electron beam writing system will be further discussed and demonstrated. The waveguide sidewall roughness improvement is analyzed on dry thermal oxidation. In this thesis, the AWG channel spacing for CWDM and DWDM were successfully demonstrated as 19 nm and 0.75 nm in the C-band, respectively, using the I-line stepper lithography. Furthermore, the silicon wire sidewall roughness was improved in the E-beam process to achieve the propagation loss of 2.93 dB/cm in the 1550-nm wavelength range.