| Summary: | 碩士 === 國立高雄大學 === 電機工程學系碩博士班 === 107 === In this thesis, ZnO/ZnO:N/MoO3 thin films were fabricated on a ruthenium substrate by spray pyrolysis. The effects of different N concentrations were discussed in terms of structure, including surface morphology, structural thin film phase, photoexcitation spectroscopy and photocatalysis. Characteristics and so on. At the appropriate N concentration doping, there is an optimum photocatalytic ability. Next, ZnO:N was replaced by MoO3:In to investigate the photocatalytic properties of different concentrations of In. Finally, the best two photocatalytic samples were used to form a four-layer structure of ZnO/ZnO:N/MoO3:In/MoO3, and its photocatalytic ability was discussed.
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