Gopalan, S. (2011). Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application.
Chicago Style (17th ed.) CitationGopalan, Sundararaman. Process Development, Material Analysis, and Electrical Characterization of Ultra Thin Hafnium Silicate Films for Alternative Gate Dielectric Application. 2011.
MLA (8th ed.) CitationGopalan, Sundararaman. Process Development, Material Analysis, and Electrical Characterization of Ultra Thin Hafnium Silicate Films for Alternative Gate Dielectric Application. 2011.
Warning: These citations may not always be 100% accurate.