Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

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Bibliographic Details
Main Author:	Gopalan, Sundararaman
Format:	Others
Language:	English
Published:	2011
Subjects:	Hafnium > Anaylsis Hafnium > Thermal properties Dielectric films Thin films > Electric properties
Online Access:	http://hdl.handle.net/2152/10984

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