Top surface imaging for sub-100nm lithography

Top surface imaging for sub-100nm lithography

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Bibliographic Details
Main Author: Jamieson, Andrew Thomas
Format: Others
Language:English
Published: 2008
Subjects:
Microlithography
Photoresists
Surface chemistry
Silylation
Online Access:http://hdl.handle.net/2152/1487

Internet

http://hdl.handle.net/2152/1487

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