Characterization and reliability of HFO₂ and hfsion gate dielectrics with tin metal gate

Characterization and reliability of HFO₂ and hfsion gate dielectrics with tin metal gate

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Bibliographic Details
Main Author: Krishnan, Siddarth A.
Format: Others
Language:English
Published: 2008
Subjects:
Gate array circuits
Dielectrics
Hafnium oxide
Online Access:http://hdl.handle.net/2152/2255

Internet

http://hdl.handle.net/2152/2255

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