Lu, X. (2008). Impact of interconnect scaling on electromigration and stress migration reliability.
Chicago Style (17th ed.) CitationLu, Xia. Impact of Interconnect Scaling on Electromigration and Stress Migration Reliability. 2008.
MLA (8th ed.) CitationLu, Xia. Impact of Interconnect Scaling on Electromigration and Stress Migration Reliability. 2008.
Warning: These citations may not always be 100% accurate.