Lu, N. (2008). High-permittivity dielectrics and high mobility semiconductors for future scaled technology: Hf-based High-K gate dielectrics and interface engineering for HfO₂/Ge CMOS device.
Chicago Style (17th ed.) CitationLu, Nan. High-permittivity Dielectrics and High Mobility Semiconductors for Future Scaled Technology: Hf-based High-K Gate Dielectrics and Interface Engineering for HfO₂/Ge CMOS Device. 2008.
MLA (8th ed.) CitationLu, Nan. High-permittivity Dielectrics and High Mobility Semiconductors for Future Scaled Technology: Hf-based High-K Gate Dielectrics and Interface Engineering for HfO₂/Ge CMOS Device. 2008.
Warning: These citations may not always be 100% accurate.