Justison, P. R. (2008). Analysis of electromigration in single- and dual-inlaid Cu interconnects.
Chicago Style (17th ed.) CitationJustison, Patrick Ryan. Analysis of Electromigration in Single- and Dual-inlaid Cu Interconnects. 2008.
MLA (8th ed.) CitationJustison, Patrick Ryan. Analysis of Electromigration in Single- and Dual-inlaid Cu Interconnects. 2008.
Warning: These citations may not always be 100% accurate.