Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography
Electron beam lithography (EBL) and Nanoimprint Lithography (NIL) are the promising tools for today’s technology in terms of resolution capability, fidelity and cost of operation. Achieving highest possible resolution is a key concept for EBL where there is a huge request in applications of nanotech...
| Main Author: | |
|---|---|
| Language: | en |
| Published: |
2011
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10012/6212 |