TRENCH ETCHING IN SILICON WITH A CONTROLLABLE SIDEWALL ANGLE (TEMPERATURE)

TRENCH ETCHING IN SILICON WITH A CONTROLLABLE SIDEWALL ANGLE (TEMPERATURE)

Bibliographic Details
Main Author: Smadi, Mithkal Moh'd, 1960-
Language:en_US
Published: The University of Arizona. 1986
Subjects:
Integrated circuits > Design and construction.
Online Access:http://hdl.handle.net/10150/276593

Internet

http://hdl.handle.net/10150/276593

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