Interstitial reactions in electron irradiated carbon-doped silicon

Bibliographic Details
Main Author:	Chappell, S. P.
Published:	University of Reading 1988
Subjects:	530.41 Electron irradiated silicon
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233143

id	ndltd-bl.uk-oai-ethos.bl.uk-233143
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-2331432015-03-19T07:11:33ZInterstitial reactions in electron irradiated carbon-doped siliconChappell, S. P.1988530.41Electron irradiated siliconUniversity of Readinghttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233143Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.41 Electron irradiated silicon
spellingShingle	530.41 Electron irradiated silicon Chappell, S. P. Interstitial reactions in electron irradiated carbon-doped silicon
author	Chappell, S. P.
author_facet	Chappell, S. P.
author_sort	Chappell, S. P.
title	Interstitial reactions in electron irradiated carbon-doped silicon
title_short	Interstitial reactions in electron irradiated carbon-doped silicon
title_full	Interstitial reactions in electron irradiated carbon-doped silicon
title_fullStr	Interstitial reactions in electron irradiated carbon-doped silicon
title_full_unstemmed	Interstitial reactions in electron irradiated carbon-doped silicon
title_sort	interstitial reactions in electron irradiated carbon-doped silicon
publisher	University of Reading
publishDate	1988
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233143
work_keys_str_mv	AT chappellsp interstitialreactionsinelectronirradiatedcarbondopedsilicon
_version_	1716754419184304128

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