The study of plasma etching in semiconductor fabrication
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University of Sussex
1984
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.276170 |
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ndltd-bl.uk-oai-ethos.bl.uk-276170 |
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ndltd-bl.uk-oai-ethos.bl.uk-2761702017-03-16T15:45:12ZThe study of plasma etching in semiconductor fabricationMorgan, R. A.1984621.31042ComponentsUniversity of Sussexhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.276170Electronic Thesis or Dissertation |
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NDLTD |
| sources |
NDLTD |
| topic |
621.31042 Components |
| spellingShingle |
621.31042 Components Morgan, R. A. The study of plasma etching in semiconductor fabrication |
| author |
Morgan, R. A. |
| author_facet |
Morgan, R. A. |
| author_sort |
Morgan, R. A. |
| title |
The study of plasma etching in semiconductor fabrication |
| title_short |
The study of plasma etching in semiconductor fabrication |
| title_full |
The study of plasma etching in semiconductor fabrication |
| title_fullStr |
The study of plasma etching in semiconductor fabrication |
| title_full_unstemmed |
The study of plasma etching in semiconductor fabrication |
| title_sort |
study of plasma etching in semiconductor fabrication |
| publisher |
University of Sussex |
| publishDate |
1984 |
| url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.276170 |
| work_keys_str_mv |
AT morganra thestudyofplasmaetchinginsemiconductorfabrication AT morganra studyofplasmaetchinginsemiconductorfabrication |
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1718421954669576192 |