Heavy ion damage in 3-5 compound semiconductors
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University of Oxford
1984
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.351408 |
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ndltd-bl.uk-oai-ethos.bl.uk-351408 |
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oai_dc |
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ndltd-bl.uk-oai-ethos.bl.uk-3514082015-03-19T10:50:18ZHeavy ion damage in 3-5 compound semiconductorsChandler, T.1984621.483Nuclear reactor technologyUniversity of Oxfordhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.351408Electronic Thesis or Dissertation |
| collection |
NDLTD |
| sources |
NDLTD |
| topic |
621.483 Nuclear reactor technology |
| spellingShingle |
621.483 Nuclear reactor technology Chandler, T. Heavy ion damage in 3-5 compound semiconductors |
| author |
Chandler, T. |
| author_facet |
Chandler, T. |
| author_sort |
Chandler, T. |
| title |
Heavy ion damage in 3-5 compound semiconductors |
| title_short |
Heavy ion damage in 3-5 compound semiconductors |
| title_full |
Heavy ion damage in 3-5 compound semiconductors |
| title_fullStr |
Heavy ion damage in 3-5 compound semiconductors |
| title_full_unstemmed |
Heavy ion damage in 3-5 compound semiconductors |
| title_sort |
heavy ion damage in 3-5 compound semiconductors |
| publisher |
University of Oxford |
| publishDate |
1984 |
| url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.351408 |
| work_keys_str_mv |
AT chandlert heavyiondamagein35compoundsemiconductors |
| _version_ |
1716777287824703488 |