The effect of structural variations on the lithographic performance of the poly(chloromethylstyrene-co-methylstyrene) resist system

The effect of structural variations on the lithographic performance of the poly(chloromethylstyrene-co-methylstyrene) resist system

Bibliographic Details
Main Author:	Griffiths, L. G.
Published:	University of Kent 1988
Subjects:	547 Polymer use in microchips
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.381679

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