A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology

Bibliographic Details
Main Author:	Yuk, Hyung-Sang
Published:	Imperial College London 2005
Subjects:	621.31937
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.416442

id	ndltd-bl.uk-oai-ethos.bl.uk-416442
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-4164422015-03-19T10:21:44ZA novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technologyYuk, Hyung-Sang2005621.31937Imperial College Londonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.416442Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	621.31937
spellingShingle	621.31937 Yuk, Hyung-Sang A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
author	Yuk, Hyung-Sang
author_facet	Yuk, Hyung-Sang
author_sort	Yuk, Hyung-Sang
title	A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
title_short	A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
title_full	A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
title_fullStr	A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
title_full_unstemmed	A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology
title_sort	novel fabrication technique of silicon germanium-on-insulator (sgoi) for sige heterostructure cmos technology
publisher	Imperial College London
publishDate	2005
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.416442
work_keys_str_mv	AT yukhyungsang anovelfabricationtechniqueofsilicongermaniumoninsulatorsgoiforsigeheterostructurecmostechnology AT yukhyungsang novelfabricationtechniqueofsilicongermaniumoninsulatorsgoiforsigeheterostructurecmostechnology
_version_	1716774035734396928

A novel fabrication technique of silicon germanium-on-insulator (SGOI) for SIGe heterostructure CMOS technology

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