Improved precursors for the chemical vapour deposition of metal oxides

Bibliographic Details
Main Author: Tobin, Neil Lawrence
Published: University of Liverpool 2004
Subjects:
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.417972
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spelling ndltd-bl.uk-oai-ethos.bl.uk-4179722015-03-19T07:36:45ZImproved precursors for the chemical vapour deposition of metal oxidesTobin, Neil Lawrence2004547.05510453University of Liverpoolhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.417972Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
topic 547.05510453
spellingShingle 547.05510453
Tobin, Neil Lawrence
Improved precursors for the chemical vapour deposition of metal oxides
author Tobin, Neil Lawrence
author_facet Tobin, Neil Lawrence
author_sort Tobin, Neil Lawrence
title Improved precursors for the chemical vapour deposition of metal oxides
title_short Improved precursors for the chemical vapour deposition of metal oxides
title_full Improved precursors for the chemical vapour deposition of metal oxides
title_fullStr Improved precursors for the chemical vapour deposition of metal oxides
title_full_unstemmed Improved precursors for the chemical vapour deposition of metal oxides
title_sort improved precursors for the chemical vapour deposition of metal oxides
publisher University of Liverpool
publishDate 2004
url http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.417972
work_keys_str_mv AT tobinneillawrence improvedprecursorsforthechemicalvapourdepositionofmetaloxides
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